11:55 AM~12:15 PM
T6-5
Fabrication of Ω-gated Negative Capacitance FinFETs and SRAM
P.-J. Sung1,3, C.-J. Su1, D. D. Lu2, S.-X. Luo2, K.-H. Kao2, J.-Y. Ciou2, C.-Y. Jao4, H.-S. Hsu4, C.-J. Wang1, T.-C. Hong3, T.-H. Liao4, C.-C. Fang4, Y.-S. Wang2, H.-F. Huang2, J.-H. Li2, Y.-C. Huang3, F.-K. Hsueh1,3, C.-T. Wu1, Y.-C. Huang3, W. C.-Y. Ma4, K.-P. Huang5, Y.-J. Lee1, T.-S. Chao3, J. -Y. Li6, W.-F. Wu1, W.-K. Yeh1 and Y.-H. Wang7
1National Nano Device Laboratories
2National Cheng Kung University
3National Chiao Tung University
4National Sun Yat-Sen University
5Industrial Technology Research Institute
6National Taiwan University
7National Applied Research Laboratories